Synthesis of nanosilica using acrylic polymers as surface modifiers

dc.contributor.authorRamasinghe, RLP
dc.contributor.authorLiyanage, NMVK
dc.date.accessioned2018-08-04T00:06:17Z
dc.date.available2018-08-04T00:06:17Z
dc.date.issued2017
dc.description.abstractPreparation and characterization of silica nanoparticles through sol-gel processing using sodium silicate as a precursor were carried out. Amorphous silica was synthesized using sodium silicate and hydrochloric acid by precipitation according to Stőber method. A system of chemical reactions has been developed using two different polymeric anionic surfactants, namely poly(methacrylic acid) (PMAA) and a copolymer of methacrylic acid and 2-ethylhexyl acrylate (PMAA-EHA)(60:40). The synthesized silica particles were characterized by using fourier transform infrared spectroscopy (FTIR), thermogravimetric analysis (TGA) and scanning electron microscopy (SEM). The FTIR analysis confirm that the nanosilica particles surface have been modified with acrylic polymers, forming ester bonds between carboxylic groups of acrylicpolymers and surface silanol groups of nanosilica. TGA studies reveal silica particles modified with polymers showed higher weight loss than unmodified nanosilica due to the decomposition of the acrylic polymer adhered to the silica nanoparticles. The SEM images of unmodified and acrylic polymer modified particles show uniform size distribution and spherical shape.en_US
dc.identifier.conferenceMoratuwa Engineering Research Conference - MERCon 2017en_US
dc.identifier.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.emaillumbiniparami@gmail.comen_US
dc.identifier.facultyEngineeringen_US
dc.identifier.placeMoratuwa, Sri Lankaen_US
dc.identifier.urihttp://dl.lib.mrt.ac.lk/handle/123/13362
dc.identifier.year2017en_US
dc.language.isoenen_US
dc.subjectsilica nanoparticles; sol-gel; sodium silicate; anionic surfactantsen_US
dc.titleSynthesis of nanosilica using acrylic polymers as surface modifiersen_US
dc.typeConference-Abstracten_US

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